Title:
低汚染プラズマ反応室の構成部品の製造方法
Document Type and Number:
Japanese Patent JP5371871
Kind Code:
B2
Abstract:
Components for use in plasma processing chambers having plasma exposed surfaces with surface roughness characteristics that promote polymer adhesion. The roughened surfaces are formed by plasma spraying a coating material such as a ceramic or high temperature polymer onto the surface of the component. The plasma sprayed components of the present invention can be used for plasma reactor components having surfaces exposed to the plasma during processing. Suitable components include chamber walls, chamber liners, baffle rings, gas distribution plates, plasma confinement rings, and liner supports. By improving polymer adhesion, the plasma sprayed component surfaces can reduce the levels of particle contamination in the process chamber thereby improving yields and reducing down-time required for cleaning and/or replacing chamber components.
Inventors:
Chan, Christopher, Shee.
Seger, Robert, Jay.
Seger, Robert, Jay.
Application Number:
JP2010086450A
Publication Date:
December 18, 2013
Filing Date:
April 02, 2010
Export Citation:
Assignee:
LAM RESEARCH CORPORATION
International Classes:
H01L21/3065; C23C4/00; H05H1/46; C23C4/02; C23C4/04; H01J37/32
Domestic Patent References:
| JP10251871A | ||||
| JP2000124137A | ||||
| JP2002249864A |
Attorney, Agent or Firm:
Yasunori Otsuka
Nishikawa Keio
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu
Nishikawa Keio
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu