Title:
A manufacturing method of a crystalline semiconductor film, and a manufacturing method of a semiconductor device
Document Type and Number:
Japanese Patent JP5948040
Kind Code:
B2
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Inventors:
Tetsuhiro Tanaka
Application Number:
JP2011236831A
Publication Date:
July 06, 2016
Filing Date:
October 28, 2011
Export Citation:
Assignee:
Semiconductor Energy Laboratory Co., Ltd.
International Classes:
H01L21/205; C23C16/455; H01L21/336; H01L29/786
Domestic Patent References:
| JP2010186988A | ||||
| JP2008091805A | ||||
| JP2008047939A |
Foreign References:
| WO2010079738A1 |