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Title:
MANUFACTURING METHOD OF CYLINDRICAL SPUTTERING TARGET
Document Type and Number:
Japanese Patent JP2017008339
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To efficiently manufacture a cylindrical sputtering target without performing sequential cooling and replenishing a joint material, the cylindrical sputtering target having less defect of an unfilled part of the joint material.SOLUTION: A manufacturing method includes: a coating step S11 of coating a joint material to an inner peripheral surface of a target material and an outside peripheral surface of a backing tube; an arranging step S12 of coaxially arranging the backing tube to a hollow part of the target material; a filling step S13 of filling the joint material to a gap part between the inner peripheral surface of the target material and the outer peripheral surface of the backing tube; an agitation step S14 of agitating the joint material filled in the gap part; and a cooling step S15 of forming a joint layer by cooling the target material and the backing tube after the agitation step. In the coating step, the outer peripheral surface of the backing tube is provided with a blast treatment and is coated with the joint material while pressure is given by adding ultrasonic vibration energy, and the inner peripheral surface of the target material is coated with the joint material while pressure is given by adding ultrasonic vibration energy.SELECTED DRAWING: Figure 2

Inventors:
IGARASHI SHIGERU
ANDO ISAO
Application Number:
JP2015121838A
Publication Date:
January 12, 2017
Filing Date:
June 17, 2015
Export Citation:
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Assignee:
SUMITOMO METAL MINING CO
International Classes:
C23C14/34; C04B37/02
Domestic Patent References:
JP2012177156A2012-09-13
JPH11510557A1999-09-14
JP2011084795A2011-04-28
JP2002301567A2002-10-15
JPH08218166A1996-08-27
JP2010523812A2010-07-15
JPH10193089A1998-07-28
JP2011181924A2011-09-15
Foreign References:
US20070074969A12007-04-05
Attorney, Agent or Firm:
Akira Koike
Seiji Iga