Title:
A manufacturing method and a decoration method of cosmetic liquid and cosmetic liquid
Document Type and Number:
Japanese Patent JP5912397
Kind Code:
B2
Abstract:
Provided are a cosmetic solution and a method for producing the cosmetic solution, the cosmetic solution being easy to store and also easy to handle during use, and moreover having a high moisturizing function, without the use of a preservative. Hyaluronic acid/or a hyaluronic acid compound is dispersed in a polyvalent alcohol, also, an organic acid and/or organic acid salt different from the hyaluronic acid and/or hyaluronic acid compound is dispersed in a polyvalent alcohol such that it contains no water. The solution contains 0.01 to 2.0 wt % hyaluronic acid and/or hyaluronic acid compound 97 wt % or more polyvalent alcohol, is weakly acidic; i.e. 5≦pH<7 due to the organic acid and/or organic acid salt.
Inventors:
Yukako Sugawara
Application Number:
JP2011228093A
Publication Date:
April 27, 2016
Filing Date:
October 17, 2011
Export Citation:
Assignee:
Yukako Sugawara
International Classes:
A61K8/73; A61K8/02; A61K8/34; A61K8/365; A61Q19/00
Domestic Patent References:
| JP2011132131A |
Foreign References:
| WO2011070620A1 |
Other References:
関根 茂,新化粧品ハンドブック,日本,日光ケミカルズ株式会社,2006年10月30日,第508-509頁
鹿子木 宏之,最近の保湿研究と保湿剤の開発動向-保湿剤開発の歴史をふまえて-,FRAGRANCE JOURNAL,日本,2005年10月15日,vol.33,No.10,第14-19頁
鹿子木 宏之,最近の保湿研究と保湿剤の開発動向-保湿剤開発の歴史をふまえて-,FRAGRANCE JOURNAL,日本,2005年10月15日,vol.33,No.10,第14-19頁
Attorney, Agent or Firm:
Yusaku Maruoka