Title:
METHOD FOR MANUFACTURING MICRONANO STRUCTURE
Document Type and Number:
Japanese Patent JP2018092142
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a method for manufacturing a micronano structure.SOLUTION: The method for manufacturing a micronano structure of the present invention includes: a first step of providing a first substrate and setting a photoresist layer on a surface of the first substrate; a second step of covering a surface of the photoresist layer with a photomask, in which the photomask comprises a second substrate and a carbon nanotube layer; a third step of irradiating the photomask with ultraviolet light, in which the ultraviolet light passes through the photomask to expose the photoresist layer; and a fourth step of removing the photomask from the surface of the photoresist layer and developing the exposed photoresist layer to obtain a patterned photoresist micronano structure.SELECTED DRAWING: Figure 1
Inventors:
CHEN MO
YI GUN-GYONG
ZHANG LI-HUI
JIN YUAN-HAO
AN DONG
FAN SHOUSHAN
YI GUN-GYONG
ZHANG LI-HUI
JIN YUAN-HAO
AN DONG
FAN SHOUSHAN
Application Number:
JP2017211315A
Publication Date:
June 14, 2018
Filing Date:
October 31, 2017
Export Citation:
Assignee:
UNIV QINGHUA
HON HAI PREC IND CO LTD
HON HAI PREC IND CO LTD
International Classes:
G03F7/20; B82Y30/00; B82Y40/00; G03F1/00
Domestic Patent References:
| JP2007504504A | 2007-03-01 | |||
| JP2007161563A | 2007-06-28 | |||
| JP2004107196A | 2004-04-08 | |||
| JP2008044099A | 2008-02-28 | |||
| JP2006228818A | 2006-08-31 |
Foreign References:
| WO2015163535A1 | 2015-10-29 | |||
| WO2009107846A1 | 2009-09-03 | |||
| US20080248235A1 | 2008-10-09 | |||
| US4892693A | 1990-01-09 |
Attorney, Agent or Firm:
try international patent corporation
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