Title:
振動デバイスの製造方法、振動デバイス、圧力センサー、スピーカー、および超音波デバイス
Document Type and Number:
Japanese Patent JP6558130
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for manufacturing a vibration device having excellent durability and capable of suppressing fatigue breakdown due to stress.SOLUTION: A method for manufacturing a vibration device comprises: an anti-oxidization film forming step of forming anti-oxidization film 44 in a partial region of a first surface 20a of a silicon substrate 10; an oxide film forming step of forming a first silicon oxide 30 serving as the oxide film in a first surface 20a region in which the anti-oxidization film 44 is not formed by thermally oxidizing the first surface 20a; an anti-oxidization film removing step of removing the anti-oxidization film 44; a vibration part forming step of forming a vibration part 22 on the first surface 20a from which the anti-oxidization film 44 was removed; and a cavity part forming step of forming a cavity part 28 in a region wider than the second surface 20b region facing the first surface 20a region formed with the anti-oxidization film 44 in the region of the second surface 20b of the silicon substrate 10 facing the first surface 20a.SELECTED DRAWING: Figure 2
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Inventors:
Kenichi Ooto
Application Number:
JP2015153942A
Publication Date:
August 14, 2019
Filing Date:
August 04, 2015
Export Citation:
Assignee:
Seiko Epson Corporation
International Classes:
G01L9/00; H01L29/84; H01L41/09; H04R17/00; H04R31/00
Domestic Patent References:
| JP10318864A | ||||
| JP2005065017A | ||||
| JP2007258680A | ||||
| JP2009139341A |
Foreign References:
| US20070138581 | ||||
| US7301212 |
Attorney, Agent or Firm:
Kazuaki Watanabe
Mitsuhiro Isobe
Satoshi Nakai
Hiroki Matsuoka
Mitsuhiro Isobe
Satoshi Nakai
Hiroki Matsuoka