Title:
The manufacturing method, the pattern formation method, and topcoat material of a structure including phase separation structure
Document Type and Number:
Japanese Patent JP6027912
Kind Code:
B2
Abstract:
A method of producing a structure containing a phase-separated structure, including forming, on a substrate, a layer containing a block copolymer having a block of a polyhedral oligomeric silsesquioxane structure-containing structural unit; forming a top coat film by applying, to the layer containing the block copolymer, a top coat material which undergoes a change in polarity upon heating, and controls a surface energy of the layer containing the block copolymer; and subjecting the layer containing the block copolymer on which the top coat film is formed to phase separation by thermal annealing.
Inventors:
Yu Matsumiya
Takehiro Seshita
Katsumi Omori
Ken Miyagi
Daishi Shiono
Kenichiro Miyashita
Tsuyoshi Kurosawa
Akira Hayakawa
Takehiro Seshita
Katsumi Omori
Ken Miyagi
Daishi Shiono
Kenichiro Miyashita
Tsuyoshi Kurosawa
Akira Hayakawa
Application Number:
JP2013033563A
Publication Date:
November 16, 2016
Filing Date:
February 22, 2013
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
National University Corporation Tokyo Institute of Technology
National University Corporation Tokyo Institute of Technology
International Classes:
B32B27/00; B05D7/24; B32B27/30; B82Y40/00; C08F220/00; C08J7/00; C09D133/14; C09D153/00; C09D183/04
Domestic Patent References:
| JP2010115832A | ||||
| JP2011078978A | ||||
| JP2011243655A | ||||
| JP2008518276A |
Foreign References:
| WO2013119832A1 |
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi
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