Title:
The manufacturing method of a photomask, a drawing device, an inspection method of a photomask, an inspection device of a photomask, and a manufacturing method of a display
Document Type and Number:
Japanese Patent JP5970021
Kind Code:
B2
Abstract:
The invention provides a method for manufacturing a photomask, an inspection method and an inspection apparatus, which can improve the coordinate accuracy of a pattern formed on a transferred object.The method for manufacturing a photomask comprises the steps of: preparing pattern design data (A); obtaining transfer surface correction data (D) indicating the amount of deformation of the main surface due to the holding of the photomask to the exposure device and the amount of deformation other than the deadweight deflection component; obtaining drawing height distribution data (E) representingthe height distribution of the main surface in a state where the photomask blank is placed on a workbench of a drawing device; drawing differential data (F) are obtained through the difference between the height distribution data (E) and the transfer surface correction data (D) during drawing; calculating a coordinate deviation amount corresponding to the drawing differential data (F), and obtaining coordinate deviation amount data (G) for drawing; and a drawing step in which drawing is performed on the photomask blank using the coordinate deviation amount data (G) for drawing and the patterndesign data (A).
Inventors:
Daisuke Kamochi
Application Number:
JP2014123396A
Publication Date:
August 17, 2016
Filing Date:
June 16, 2014
Export Citation:
Assignee:
HOYA CORPORATION
International Classes:
G03F1/76; G03F1/42; G03F1/84
Domestic Patent References:
| JP2003500847A | ||||
| JP2011175240A | ||||
| JP2010134433A | ||||
| JP8250394A | ||||
| JP8297692A | ||||
| JP8255743A |
Attorney, Agent or Firm:
Patent business corporation Tsukuni
Hajime Tsukuni
Toshio Miyake
Akio Shibata
Takashi Ishioka
Hajime Tsukuni
Toshio Miyake
Akio Shibata
Takashi Ishioka