Title:
A manufacturing method of a manufacturing method of a photosensitive resin composition and a pattern, an organic EL display, or a liquid crystal display, and a hardening film
Document Type and Number:
Japanese Patent JP6035418
Kind Code:
B2
Abstract:
Provided are: a photosensitive resin composition which has excellent sensitivity, line width stability, resolution, rectangularity and adhesion to a substrate; a method for producing a pattern; a method for manufacturing an organic EL display device or a liquid crystal display device; and a cured film. A photosensitive resin composition which contains (A) a polymer having a group that is protected by an acid-decomposable group, (B) a compound represented by general formula (3), and (C) a solvent.
Inventors:
Susumu Fujimoto
Kyohei Sakita
Fumie Yamashita
Go Ando
Kyohei Sakita
Fumie Yamashita
Go Ando
Application Number:
JP2015522808A
Publication Date:
November 30, 2016
Filing Date:
June 11, 2014
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G03F7/004; C08F12/22; C08F20/26; G02F1/1333; G03F7/039; H01L51/50; H05B33/10
Domestic Patent References:
| JP2013061616A | 2013-04-04 | |||
| JP2014197155A | 2014-10-16 | |||
| JP2012133211A | 2012-07-12 | |||
| JPS5749669A | 1982-03-23 | |||
| JP2011227106A | 2011-11-10 |
Foreign References:
| WO2014020984A1 | 2014-02-06 |
Attorney, Agent or Firm:
Patent Service Corporation Patent Office Sykes