Title:
A manufacturing method of a positive type photosensitive resin composition, an insulating film formed from now on, an organic light emitting element, and a positive type photosensitive resin composition
Document Type and Number:
Japanese Patent JP5911580
Kind Code:
B2
Abstract:
This invention relates to a positive-type photosensitive resin composition which includes an alkali soluble polyimide resin, a diazide-based photosensitive compound and a sensitivity enhancer, and in which the use of a polyimide resin wherein the degree of imidization of imidized polyimide resin is 50˜75% exhibits a light transmittance of 95% or more in the visible light wavelength range (400˜650 nm) as well as high developability in a patterning process, and to an insulating film and an OLED formed using the same.
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Inventors:
Park, Seung Hyun
Kim Byung-ki
Kim Byung-ki
Application Number:
JP2014528309A
Publication Date:
April 27, 2016
Filing Date:
September 24, 2012
Export Citation:
Assignee:
Kolon Industries Inc.
International Classes:
G03F7/023; C08G73/10; H01L51/50; H05B33/22
Domestic Patent References:
JP2005242328A | ||||
JP2010134116A | ||||
JP2010061111A | ||||
JP2010037425A | ||||
JP2010101957A |
Attorney, Agent or Firm:
Yamashita
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