A manufacturing method of the refined active silicic acid liquid and silica sol

Title:

A manufacturing method of the refined active silicic acid liquid and silica sol

Document Type and Number:

Japanese Patent JP5920604

Kind Code:

B2

Abstract:

There is provided a method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. A method for producing an active silicic acid solution fulfilling the following condition: (1) the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 µm and a thickness of 1 to 100 nm is measured to be 0% to 30% in accordance with measuring method A, the method characterized by including the steps of: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components; and filtering the active silicic acid solution through a filter whose removal rate of particles having a primary particle size of 1.0 µm is 50% or more, and whose filtering rate is 13 L/min to 400 L/min per 1 m 2 of the filtration area of the used filter.

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Inventors:

Ema Kiyomi
Takayuki Noriyuki
Toru Nishimura
Naoki Kawashita
Koji Yamaguchi

Application Number:

JP2013533735A

Publication Date:

May 18, 2016

Filing Date:

September 14, 2012

Export Citation:

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