Title:
RESIN, RESIST COMPOSITION, AND PRODUCTION METHOD OF RESIST PATTERN
Document Type and Number:
Japanese Patent JP2016145348
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a resin to be used for a resist composition from which a resist pattern can be produced with good line edge roughness, and a resist composition.SOLUTION: The resin includes a structural unit represented by formula (I) and a structural unit having an acid-labile group. In formula (I), Rrepresents a hydrogen atom, a halogen atom, or an alkyl group having 1 to 6 carbon atoms which may have a halogen atom; Lrepresents a single bond or a divalent saturated hydrocarbon group having 1 to 18 carbon atoms, in which a methylene group included in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group; and Lrepresents a divalent cyclic hydrocarbon group having 4 o 18 carbon atoms which may have a substituent.SELECTED DRAWING: None
Inventors:
MASUYAMA TATSURO
FUJITA SHINGO
ICHIKAWA KOJI
FUJITA SHINGO
ICHIKAWA KOJI
Application Number:
JP2016015388A
Publication Date:
August 12, 2016
Filing Date:
January 29, 2016
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C08F226/06; C08F220/36; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2007272087A | 2007-10-18 | |||
| JP2001172336A | 2001-06-26 | |||
| JP2004176034A | 2004-06-24 | |||
| JP2014114437A | 2014-06-26 | |||
| JP2014026260A | 2014-02-06 | |||
| JP2014156586A | 2014-08-28 |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation
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