Title:
A manufacturing method of a resist composition and a resist pattern
Document Type and Number:
Japanese Patent JP6034025
Kind Code:
B2
Abstract:
A resist composition of the invention includes: (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and (B) an acid generator represented by the formula (II), wherein R1, A1, R2, Q1, Q2, L1, ring W1, and Z+ are defined in the specification.
Inventors:
Koji Ichikawa
Norifumi Yamaguchi
Norifumi Yamaguchi
Application Number:
JP2012033537A
Publication Date:
November 30, 2016
Filing Date:
February 20, 2012
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
G03F7/004; C08F20/22; G03F7/039
Domestic Patent References:
| JP2011095623A | ||||
| JP2011128226A | ||||
| JP2011126944A | ||||
| JP2012113302A | ||||
| JP2012141614A | ||||
| JP2013513827A | ||||
| JP2012197261A | ||||
| JP2012006908A | ||||
| JP2012031134A | ||||
| JP8202038A | ||||
| JP2011227437A |
Foreign References:
| WO2011034176A1 |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation