A manufacturing method of a resist composition and a resist pattern

Title:

A manufacturing method of a resist composition and a resist pattern

Document Type and Number:

Japanese Patent JP6208974

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a resist composition capable of manufacturing a resist pattern having high resolution.SOLUTION: A resist composition includes: a resin having a structural unit represented by a formula (I) and a structural unit containing an acid unstable group; and an acid generating agent containing an acid unstable group. [In the formula, Rrepresents a 1-6C alkyl group that may have a halogen atom, a hydrogen atom, or a halogen atom; Arepresents a single bond,-A-O-,-A-CO-O-,-A-CO-O-A-CO-O-, or-A-O-CO-A-O-; * represents a bond with -O-; and Aand Aeach represent independently 1-6C alkanediyl.]

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Inventors:

Koji Ichikawa
Takayuki Miyagawa
Norifumi Yamaguchi

Application Number:

JP2013095113A

Publication Date:

October 04, 2017

Filing Date:

April 30, 2013

Export Citation:

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Assignee:

Sumitomo Chemical Co., Ltd.

International Classes:

G03F7/004; C07D307/33; C07D307/93; C07D313/10; C07D327/06; C09K3/00; G03F7/038; G03F7/039

Domestic Patent References:

JP2011219363A
JP2012078405A
JP2004210670A
JP2012041274A
JP2013001715A

Foreign References:

WO2011125291A1
WO2012020546A1

Attorney, Agent or Firm:

Shinki Global IP Patent Corporation

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