Title:
レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP6670601
Kind Code:
B2
Abstract:
A photoresist composition comprising: a resin (A1) which has an acid-labile group; a resin (A2) which comprises a structural unit represented by formula (I); wherein R1 represents a C1-C13 fluorinated saturated hydrocarbon group, A1 represents a single bond, a C1-C6 alkanediyl group, or *-A2-X1-(A3-X2)a-(A4)b-, and R2 represents a C1-C18 hydrocarbon group; and an acid generator.
Inventors:
Tatsuro Masuyama
Shingo Fujita
Koji Ichikawa
Shingo Fujita
Koji Ichikawa
Application Number:
JP2015241267A
Publication Date:
March 25, 2020
Filing Date:
December 10, 2015
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
G03F7/038; C08F22/18; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2007140228A | ||||
| JP2009288771A | ||||
| JP2008102276A | ||||
| JP2002309057A | ||||
| JP2014044414A | ||||
| JP6049140A |
Foreign References:
| US20130171560 |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation