Title:
A manufacturing method of salt, a resist composition, and a resist pattern
Document Type and Number:
Japanese Patent JP6201564
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a salt and a resist composition from which a resist pattern with high CD uniformity can be produced.SOLUTION: The salt is represented by formula (I). In formula (I), Qand Qeach independently represent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms; Lrepresents a divalent saturated hydrocarbon group having 1 to 24 carbon atoms; A represents a heterocyclic group having 2 to 36 carbon atoms and having -S-CO- as a structure constituting a ring, and a hydrogen atom in the heterocyclic group may be replaced by a halogen atom, hydroxy group, saturated hydrocarbon group having 1 to 12 carbon atoms, aromatic hydrocarbon group having 6 to 24 carbon atoms, alkoxy group having 1 to 12 carbon atoms, an acyl group having 2 to 4 carbon atoms, or acyloxy group having 2 to 4 carbon atoms; and Zrepresents an organic counter ion.
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Inventors:
Mitsuyoshi Ochiai
Koji Ichikawa
Koji Ichikawa
Application Number:
JP2013196748A
Publication Date:
September 27, 2017
Filing Date:
September 24, 2013
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D333/36; C07C381/12; G03F7/004; G03F7/038; G03F7/039
Domestic Patent References:
| JP2011253017A | ||||
| JP2013256496A | ||||
| JP2012032602A | ||||
| JP2011184434A | ||||
| JP2011037836A | ||||
| JP2014178645A | ||||
| JP2014235248A | ||||
| JP2006306856A |
Foreign References:
| WO2013111667A1 | ||||
| US5274122 |
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto