Title:
シリカ分散-スチレン高分子ナノコンポジットの製造方法
Document Type and Number:
Japanese Patent JP5427414
Kind Code:
B2
Abstract:
A method of preparing a styrene polymer-silica nanocomposite is disclosed. One embodiment of the method includes polymerizing about 100 parts by weight of a monomer mixture including about 50 to about 80% by weight of an aromatic monomer an about 20 to about 50% by weight of a vinyl cyanide monomer with about 0.5 to about 30 parts by weight of a colloidal silica dispersed in a first organic solvent.
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Inventors:
Lee, Byung
Jin, Youngsu
Park, Wan Suk
Hong, Jekun
Ryu, Youngsik
Kim, Il Jin
Jin, Youngsu
Park, Wan Suk
Hong, Jekun
Ryu, Youngsik
Kim, Il Jin
Application Number:
JP2008547078A
Publication Date:
February 26, 2014
Filing Date:
December 29, 2005
Export Citation:
Assignee:
Cheil Industries Inc.
International Classes:
C08F2/44; C08F292/00; C08K3/36; C08L25/12
Domestic Patent References:
| JP11302576A | ||||
| JP9110909A | ||||
| JP2004323634A | ||||
| JP2004175915A |
Foreign References:
| WO1996034036A1 |
Attorney, Agent or Firm:
Hatta International Patent Corporation