Title:
A manufacturing method of the substrate for mask blanks, a manufacturing method of a mask blank, and a manufacturing method of the mask for transfer
Document Type and Number:
Japanese Patent JP6208264
Kind Code:
B2
Abstract:
A method for manufacturing a low-defect and high-quality mask blank substrate with minimized transfer pattern defects and high mechanical strength, particularly such that the occurrence of a phenomenon where a portion of a transfer pattern and a principal surface of the substrate therebeneath are broken off together is minimized such that there is little pattern loss. The mask blank is manufactured by preparing a mask blank substrate (X) having a substrate principal surface (X1) polished using a polishing solution containing abrasive grains, etching the substrate principal surface (X1) using catalyst-referred etching so as to remove damaged portions from the principal surface (X1), and then depositing a thin film that forms a transfer pattern on the substrate principal surface (X1) of the substrate (X) by sputtering.
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Inventors:
Takeyuki Yamada
Takahito Nishimura
Takahito Nishimura
Application Number:
JP2016014127A
Publication Date:
October 04, 2017
Filing Date:
January 28, 2016
Export Citation:
Assignee:
HOYA CORPORATION
International Classes:
G03F1/60; C03C15/02; G03F1/32; H01L21/027; H01L21/306
Domestic Patent References:
| JP4526547B2 | ||||
| JP2008071857A | ||||
| JP10058236A | ||||
| JP2012064972A | ||||
| JP2000330262A | ||||
| JP2012154976A |
Attorney, Agent or Firm:
Yutaka Nagata
Takafumi Oshima
Tsukasa Ota
Takafumi Oshima
Tsukasa Ota