Title:
POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PATTERN, ORGANIC ELECTROLUMINESCENT ELEMENT, METHOD FOR PRODUCING SUBSTRATE INCLUDING PATTERN AND METHOD FOR PRODUCING POLYMER
Document Type and Number:
Japanese Patent JP2019137762
Kind Code:
A
Abstract:
To provide a material that has high liquid repellency of an organic solvent and can be suitably used as, for example, a partition wall forming material of an organic EL element.SOLUTION: The present invention provides a polymer containing a structural unit represented by general formula (A1) (containing a cyclic olefin structure), and at least one selected from the group consisting of a structural unit represented by general formula (B1) and a structural unit represented by general formula (B2) (where, a siloxane structure is introduced into a maleic anhydride structure), and a method for producing the polymer. There are also provided: a photosensitive resin composition containing the polymer and a photosensitizer; a photosensitive resin film formed from the photosensitive resin composition; a pattern obtained by exposing and developing the photosensitive resin film and a method for producing the same; and an organic electroluminescent element including the pattern.SELECTED DRAWING: Figure 1
Inventors:
IMAI KEITA
TSUCHIYA EIKO
TSUCHIYA EIKO
Application Number:
JP2018021550A
Publication Date:
August 22, 2019
Filing Date:
February 09, 2018
Export Citation:
Assignee:
SUMITOMO BAKELITE CO
International Classes:
C08F8/32; C08F232/00; G03F7/023; G03F7/075; G03F7/20; H01L51/50; H05B33/10
Domestic Patent References:
| JP2017057260A | 2017-03-23 | |||
| JP2015184325A | 2015-10-22 | |||
| JP2017203058A | 2017-11-16 | |||
| JP2016531191A | 2016-10-06 |
Foreign References:
| WO2016175103A1 | 2016-11-03 |
Attorney, Agent or Firm:
Shinji Hayami