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Title:
表面修飾基材の製造方法、接合体の製造方法、新規ヒドロシラン化合物および表面修飾基材
Document Type and Number:
Japanese Patent JP5924633
Kind Code:
B2
Abstract:
The method for producing a surface-modified base material according to the present invention includes a step of bringing a base material having a polar group present on a surface thereof into contact with a hydrosilane compound having a molecular structure A and having a Si-H group composed of a silicon atom of the molecular structure A and a hydrogen atom bonded to the silicon atom in the presence of a borane catalyst so as to allow a dehydrocondensation reaction to take place between the base material and the compound, thereby forming the base material surface-modified with the molecular structure A. This production method is capable of surface-modifying a base material at a lower temperature in a shorter time than conventional methods and allows a wide variety of options for the form, type, and application of the base material, the mode of the modification reaction, and the type of the molecular structure with which the base material is surface-modified.

Inventors:
Kazuki Nakanishi
Moitra Nirmaria
Kanamori
Toyoji Shimada
Application Number:
JP2015535915A
Publication Date:
May 25, 2016
Filing Date:
March 09, 2015
Export Citation:
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Assignee:
Kyoto University
International Classes:
C09K3/00; B01J31/02; C07F7/08; C07F7/10; C07F7/12; C07F9/28; C07F9/40; C07F19/00
Domestic Patent References:
JPH04214880A1992-08-05
JPH06130716A1994-05-13
JP2005219959A2005-08-18
JP2009149454A2009-07-09
JP2010090007A2010-04-22
JP2009256670A2009-11-05
JPH04214880A1992-08-05
JPH06130716A1994-05-13
JP2005219959A2005-08-18
JP2009149454A2009-07-09
JP2010090007A2010-04-22
Foreign References:
WO2001058562A12001-08-16
EP1627892A12006-02-22
WO2001058562A12001-08-16
EP1627892A12006-02-22
Attorney, Agent or Firm:
Koichi Kamata