Title:
MANUFACTURING METHOD FOR VAPOR DEPOSITION MASK
Document Type and Number:
Japanese Patent JP2016199775
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a method for manufacturing a vapor deposition mask having a through hole formed to have a complex shape, by making use of a plating treatment.SOLUTION: A vapor deposition mask manufacturing method comprises: a preparing step of preparing a substrate having a surface defined into a plurality of high adhesion regions and a low adhesion region enclosing the high adhesion regions; a plating resist forming step of forming a plating resist pattern through a predetermined clearance over the surface of the substrate; and a plating treatment step of precipitating a metal layer on the surface of the substrate in the clearance of the plating resist pattern. The plating resist forming step is executed so that the plating resist pattern may cover the high adhesion regions and may extend to the low adhesion region and so that the clearance of the plating resist pattern may be positioned over the low adhesion region. At the plating treatment step, therefore, a plating solution is enabled to immerse partially between the low adhesion region and the plating resist pattern.SELECTED DRAWING: Figure 11
Inventors:
IKENAGA CHIKAO
Application Number:
JP2015078522A
Publication Date:
December 01, 2016
Filing Date:
April 07, 2015
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD
International Classes:
C23C14/04; C25D1/10; C25D5/02; G03F7/40; H01L51/50; H05B33/10
Domestic Patent References:
| JP2001234385A | 2001-08-31 | |||
| JP2005154879A | 2005-06-16 | |||
| JP2003045657A | 2003-02-14 | |||
| JP2005076068A | 2005-03-24 | |||
| JP2016148112A | 2016-08-18 |
Attorney, Agent or Firm:
Hirohito Katsunuma
Hiroyuki Nagai
Yukihiro Hotta
Kazuo Okamura
Hiroyuki Nagai
Yukihiro Hotta
Kazuo Okamura
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