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Title:
A manufacturing method of a vapor deposition mask with a metallic frame, a manufacturing method of an organic semiconductor element
Document Type and Number:
Japanese Patent JP6090009
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for manufacturing a vapor deposition mask having a metal frame, in which a vapor deposition mask capable of being highly defined and weight-saved even when increased in size and a metal frame are precisely fixed.SOLUTION: A vapor deposition mask 100 is configured by laminating: a metallic mask 10 having a plurality of slits 15 formed therethrough; and a resin mask 20 positioned on a surface of the metallic mask 10 and having openings 25 formed to correspond to a pattern to be formed by a vapor deposition. There is a fixing step of fixing the vapor deposition mask, in which the metallic mask 10 formed with the slits 15 and the resin mask 20 formed with the openings 25 corresponding to the pattern to be vapor-deposited at a position to overlap the slits are laminated, to the metal frame formed with through holes.

Inventors:
Katsuya Obata
Eisuke Okamoto
Application Number:
JP2013136822A
Publication Date:
March 08, 2017
Filing Date:
June 28, 2013
Export Citation:
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Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
H01L51/50; C23C14/04; H05B33/10
Domestic Patent References:
JP2012229484A
JP2005174843A
JP2004311335A
JP2006092752A
JP2006188752A
JP7300664A
JP2003332057A
JP2004190057A
JP2005350712A
Foreign References:
US20040202821
Attorney, Agent or Firm:
Patent Business Corporation Intect International Patent Office
Yasuo Ishikawa
Yoshinori Ishibashi