Title:
A mark position measuring device, a method, a lithography device, and a device manufacturing method
Document Type and Number:
Japanese Patent JP6002851
Kind Code:
B2
Abstract:
An apparatus to measure the position of a mark, the apparatus including an illumination arrangement to direct radiation across a pupil of the apparatus, the illumination arrangement including an illumination source to provide multiple-wavelength radiation of substantially equal polarization and a wave plate to alter the polarization of the radiation in dependency of the wavelength, such that radiation of different polarization is supplied; an objective to direct radiation on the mark using the radiation supplied by the illumination arrangement while scanning the radiation across the mark in a scanning direction; a radiation processing element to process radiation that is diffracted by the mark and received by the objective; and a detection arrangement to detect variation in an intensity of radiation output by the radiation processing element during the scanning and to calculate from the detected variation a position of the mark in at least a first direction of measurement.
Inventors:
Matthewsen, Simon, Geisbert, Josephus
Den bouff, allie, jeffrey
Dura's Cuwiz, Stanley
Kreuzer, Justin
Nimeier, Gerrit, Johannes
Den bouff, allie, jeffrey
Dura's Cuwiz, Stanley
Kreuzer, Justin
Nimeier, Gerrit, Johannes
Application Number:
JP2015536046A
Publication Date:
October 05, 2016
Filing Date:
September 23, 2013
Export Citation:
Assignee:
AS M Netherlands B.V.
AS ML Holding N.V.
AS ML Holding N.V.
International Classes:
G01B11/00; G03F7/20
Domestic Patent References:
| JP2009147317A | ||||
| JP2007225841A | ||||
| JP2008532320A | ||||
| JP2004119663A | ||||
| JP2007273954A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki