Title:
マスク及びその製造方法、並びに、露光方法
Document Type and Number:
Japanese Patent JP4684584
Kind Code:
B2
Abstract:
A mask manufacturing method suitable for an exposure method wherein a mask on which a desired pattern and a supplementary pattern with formations smaller than those of the desired pattern are arrayed is illuminated, and the light which passed through the mask onto a member to be exposed is projected via a projection optical system, said method comprising a selecting step for selecting one of the following three supplementary patterns, a first supplementary pattern wherein said supplementary pattern is disposed at a position where a line extending in the vertical direction as to the pitch direction from a certain desired pattern hole of said desired pattern, and a line connecting the supplementary pattern hole closest to said certain desired pattern hole in the vertical direction with said certain desired pattern hole, intersect at an angle of 0°, a second supplementary pattern wherein said supplementary pattern is disposed at a position where said angle is 0° or more but less than 45°, and a third supplementary pattern wherein said supplementary pattern is disposed at a position where said angle is 45°.
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Inventors:
Kenji Yamazoe
Kenji Saito
Kenji Saito
Application Number:
JP2004203098A
Publication Date:
May 18, 2011
Filing Date:
July 09, 2004
Export Citation:
Assignee:
Canon Inc
International Classes:
G03C5/00; G03F1/36; G03F1/68; G03F1/70; G03F7/20; G03F9/00; H01L21/027; H01L21/82; H01L21/822; H01L27/04
Domestic Patent References:
| JP2002122976A | ||||
| JP3015845A | ||||
| JP11008179A | ||||
| JP2001110719A | ||||
| JP2003203850A |
Attorney, Agent or Firm:
Ryosuke Fujimoto