The mask which has an extreme ultraviolet-rays lithography process, the reduced shadow effect, and the intensity which improved - Taiwan Semiconductor Manufacturing Company,Ltd.

Title:

The mask which has an extreme ultraviolet-rays lithography process, the reduced shadow effect, and the intensity which improved

Document Type and Number:

Japanese Patent JP6023777

Kind Code:

B2

Inventors:

Roh Hikojo
You Nobukatsu
Chen Masahiro
Heinan

Application Number:

JP2014236676A

Publication Date:

November 09, 2016

Filing Date:

November 21, 2014

Export Citation:

Assignee:

Taiwan Semiconductor Manufacturing Company,Ltd.

International Classes:

G03F1/24; G02B19/00

Domestic Patent References:

Foreign References:

US20140011120

Attorney, Agent or Firm:

Asahina Patent Office

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