Title:
A method and a device for exhausting a processing chamber
Document Type and Number:
Japanese Patent JP6242393
Kind Code:
B2
Abstract:
A pumping device intended to be connected to a process chamber (2) includes a dry primary vacuum pump, an auxiliary pump mounted so that the auxiliary pump bypasses a check valve on the vacuum pump, a first valve device connected to a purging device for purging the dry primary vacuum pump and intended to be connected to a gas supply, a second valve device mounted so that the second valve device bypasses a check valve upstream from the auxiliary pump, and a controller configured to control the first and second valve devices on the basis of an operating status of the process chamber in such a way that the first valve device is at least partially closed and the second valve device is open when the process chamber is operating at ultimate vacuum. Also a method for pumping of a process chamber by way of such a pumping device.
Inventors:
Bertrand Sejo
Application Number:
JP2015522062A
Publication Date:
December 06, 2017
Filing Date:
July 15, 2013
Export Citation:
Assignee:
Pfeiffer Bakiyumu
International Classes:
F04F5/20; F04C23/00; F04C25/02; F04F5/22; F04F5/46; F04F5/48
Domestic Patent References:
| JP11082346A |
Foreign References:
| DE2408256A1 | ||||
| FR2952683A1 |
Attorney, Agent or Firm:
Soichi Takezawa
Noritsugu Nakama
Noritsugu Nakama