Title:
フォトレジストとして有用な縮合4員複素環を有する多環式基を有するフッ素化モノマー、フッ素化ポリマー、および微細平版印刷のための方法
Document Type and Number:
Japanese Patent JP2005535709
Kind Code:
A
Abstract:
The present invention provides novel fluorine-containing copolymers which comprise at least one fluorinated olefin, at least one polycyclic ethylenically unsaturated monomer with a fused 4-membered heterocyclic ring and, optionally, other components. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The copolymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.
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Inventors:
Andrew E. Failing
Frank El. Shut The Third
Buyacheslav Alexandrovich Petrov
Bruce Edmund Smart
William Brown Farnham
Frank El. Shut The Third
Buyacheslav Alexandrovich Petrov
Bruce Edmund Smart
William Brown Farnham
Application Number:
JP2004527970A
Publication Date:
November 24, 2005
Filing Date:
August 08, 2003
Export Citation:
Assignee:
E.I.DU PONT DE NEMOURS AND COMPANY
International Classes:
G03F7/039; C07D205/12; C07D305/14; C07D493/10; C08F2/00; C08F34/00; C08F214/26; C08F232/08; G03F7/004; G03F7/038; (IPC1-7): C07D305/14; C07D493/10; C08F34/00; C08F214/26; G03F7/039
Attorney, Agent or Firm:
Yoshikazu Tani
Kazuo Abe
Kazuo Abe