Title:
フォトレジストとして有用な縮合4員環状炭素を有する多環式基を有するフッ素化ポリマーおよび微細平版印刷のための方法
Document Type and Number:
Japanese Patent JP4610335
Kind Code:
B2
Abstract:
This invention provides novel fluorine containing polymers which comprise at least one fluorinated olefin, at least one polycyclic ethylenically unsaturated monomer with a fused 4-membered carbocyclic ring and, optionally, other components. The polymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The polymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.
Inventors:
Andrew E. Failing
Frank El. Shut The Third
Buyacheslav Alexandrovich Petrov
Bruce Edmund Smart
William Brown Farnham
Frank El. Shut The Third
Buyacheslav Alexandrovich Petrov
Bruce Edmund Smart
William Brown Farnham
Application Number:
JP2004527971A
Publication Date:
January 12, 2011
Filing Date:
August 08, 2003
Export Citation:
Assignee:
E.I.DU PONT DE NEMOURS AND COMPANY
International Classes:
C08F232/00; C08F8/00; C08F214/18; C08F214/26; C08F216/12; C08F220/24; C08F232/08; G03C1/492; G03F7/004; G03F7/038; G03F7/039; H01L21/027
Domestic Patent References:
| JP2003252928A |
Attorney, Agent or Firm:
Yoshikazu Tani
Kazuo Abe
Kazuo Abe