Title:
フォトレジストとして有用なフッ素化ポリマーおよび微細平版印刷のための方法
Document Type and Number:
Japanese Patent JP2005536589
Kind Code:
A
Abstract:
This invention provides a fluorine-containing copolymer having a repeat unit derived from at least one fluorinated olefin and a repeat unit derived from at least one polycyclic ethylenically unsaturated monomer having pendant hydroxyl or esterified hydroxyl groups, and optionally other repeat units, typically derived from an acrylate. These polymers have high transparency at short wavelengths such as 193 nm and 157 nm, and provide good plasma etch resistance and adhesive properties. Also provided are photoresist compositions and substrates coated therewith.
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Inventors:
Andrew Edward Failing
Frank El. Shut the Third
William Brown Farnham
Gerald Feldman
Frank El. Shut the Third
William Brown Farnham
Gerald Feldman
Application Number:
JP2004529165A
Publication Date:
December 02, 2005
Filing Date:
August 19, 2003
Export Citation:
Assignee:
E.I.DU PONT DE NEMOURS AND COMPANY
International Classes:
C08F8/00; C08F214/18; C08F214/26; C08F232/00; C08F232/08; C08F234/02; G03F7/004; G03F7/039; H01L21/027; (IPC1-7): C08F214/18; C08F232/00; C08F234/02; G03F7/039; H01L21/027
Domestic Patent References:
| JP2001209181A | 2001-08-03 | |||
| JPH11265067A | 1999-09-28 | |||
| JPH11242337A | 1999-09-07 |
Foreign References:
| WO2000067072A1 | 2000-11-09 |
Attorney, Agent or Firm:
Yoshikazu Tani
Kazuo Abe
Kazuo Abe