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Title:
間欠的なプリカーサガスフロープロセスを使用して金属層を形成する方法。
Document Type and Number:
Japanese Patent JP5019430
Kind Code:
B2
Abstract:
A method is provided for forming a metal layer on a substrate using an intermittent precursor gas flow process. The method includes exposing the substrate to a reducing gas while exposing the substrate to pulses of a metal-carbonyl precursor gas. The process is carried out until a metal layer with desired thickness is formed on the substrate. The metal layer can be formed on a substrate, or alternately, the metal layer can be formed on a metal nucleation layer.

Inventors:
Mountain Saki Eisuke
Tsukasa Matsuda
Atsushi Gomi
Tatsuo Hatano
Mitsuhiro Tachibana
Matsuaki Komei
Yumiko Kono
Ruthink, Jart J.
MacFeeley, Fenton Earl.
Malhotra, Sandra Gee.
Simon, Andrew H.
Jurcus, John Jay.
Application Number:
JP2006533889A
Publication Date:
September 05, 2012
Filing Date:
September 07, 2004
Export Citation:
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Assignee:
東京エレクトロン株式会社
INTERNATIONAL BUSINESS MASCHINES CORPORATION
International Classes:
H01L21/285; C23C16/04; C23C16/16; C23C16/44; C23C16/455; H01L21/28; H01L21/768
Foreign References:
WO2003009360A1
US20030157760
WO2003029515A1
Attorney, Agent or Firm:
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa



 
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