Title:
A method for manufacturing a multi-imposition vapor deposition mask and a method for manufacturing a multi-imposition vapor deposition mask and an organic semiconductor device obtained thereby.
Document Type and Number:
Japanese Patent JP6318472
Kind Code:
B2
Abstract:
A method for producing a multiple-surface imposition vapor deposition mask that enhances definition and reduces weight even when a size is increased. Each of multiple masks in an open space in a frame is configured by a metal mask having a slit, and a resin mask that is positioned on a front surface of the metal mask and has openings corresponding to a pattern to be produced by vapor deposition arranged by lengthwise and crosswise in a plurality of rows. In formation of the plurality of masks, after each of the metal masks and a resin film material for producing the resin mask are attached to the frame, the resin film material is processed, and the openings corresponding to the pattern to be produced by vapor deposition are formed in a plurality of rows lengthwise and crosswise, whereby the multiple-surface imposition vapor deposition mask of the above described configuration is produced.
Inventors:
Yoshinori Hirobe
Yutaka Matsumoto
Masato Ushikusa
Toshihiko Takeda
Katsuya Obata
Yuyuki Nishimura
Yutaka Matsumoto
Masato Ushikusa
Toshihiko Takeda
Katsuya Obata
Yuyuki Nishimura
Application Number:
JP2013117239A
Publication Date:
May 09, 2018
Filing Date:
June 03, 2013
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
C23C14/24; C23C14/12; H01L51/50; H05B33/10
Domestic Patent References:
| JP2003217850A | ||||
| JP2009287113A | ||||
| JP2010062125A | ||||
| JP2005174843A | ||||
| JP2008274373A | ||||
| JP63076859A |
Foreign References:
| US20040202821 |
Attorney, Agent or Firm:
Patent Business Corporation Intect International Patent Office
Yoshinori Ishibashi
Yoshinori Ishibashi