Title:
遠心力を用いる微細流体処理基板内で少なくとも二種類の流体を混合する方法
Document Type and Number:
Japanese Patent JP5134870
Kind Code:
B2
Abstract:
Provided is a method of mixing fluids including sequentially introducing at least two kinds of fluids to a mixing chamber (15) of a micro-fluid treatment substrate (10); and alternately rotating the micro-fluid treatment substrate clockwise and counter-clockwise until the at least two kinds of fluids are mixed, wherein the rotation is changed to the opposite direction before a vortex created in the mixing chamber by one of the clockwise and counter-clockwise rotations disappears. Provided is a method of mixing fluids including introducing a fluid to a mixing chamber (15) of a micro-fluid treatment substrate (10); introducing at least one of another kind of fluid to at least one supply chamber connected to the mixing chamber of the micro-fluid treatment substrate through a channel; and alternately rotating the micro-fluid treatment substrate clockwise and counter-clockwise until the fluid in the supply chamber flows into the mixing chamber and is mixed with the fluid in the mixing chamber using centrifugal force, wherein the rotation is changed to the opposite direction before a vortex created in the mixing chamber by one of the clockwise and counter-clockwise rotations disappears.
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Inventors:
Lord Zhao
Lee En-ken
Lee
Park
Lee En-ken
Lee
Park
Application Number:
JP2007165904A
Publication Date:
January 30, 2013
Filing Date:
June 25, 2007
Export Citation:
Assignee:
Samsung Electronics Co.,Ltd.
International Classes:
B01F11/00; B01J19/00
Domestic Patent References:
| JP2007040833A | ||||
| JP2005530127A | ||||
| JP2002526232A | ||||
| JP2005007292A | ||||
| JP2005030987A | ||||
| JP3124425U | ||||
| JP2006500596A |
Attorney, Agent or Firm:
Hatta International Patent Corporation