Title:
酸化インジウム中に錫が固溶したITO粉末の製造方法及びITOターゲットの製造方法
Document Type and Number:
Japanese Patent JP4060187
Kind Code:
B2
Abstract:
The present invention relates to a manufacturing method of ITO powder with tin dissolved in indium oxide, wherein the ITO powder is obtained by performing splay pyrolysis to a mixed solution or slurry of indium nitrate and tin chloride in which the concentration of indium and tin is 3.0 mol/L or more, thereby providing at low costs ITO powder superior in component dispersibility by dissolving tin in indium oxide as well as a precise ITO target superior in uniformity. It is thereby possible to restrain the deterioration of quality or abnormal protrusions such as nodules in oases where the ITO sputtering target deposition is not uniform.
Inventors:
Yoshiro Yangi
Atsushi Nakamura
Atsushi Nakamura
Application Number:
JP2002561448A
Publication Date:
March 12, 2008
Filing Date:
December 19, 2001
Export Citation:
Assignee:
Nikko Metal Co., Ltd.
International Classes:
C01G19/00; C23C14/34; H01B5/14
Domestic Patent References:
| JP61270201A | ||||
| JP64087519A | ||||
| JP7316803A |
Attorney, Agent or Firm:
Isamu Ogoshi