Title:
感光性樹脂組成物、ソルダーレジスト用組成物、プリント配線板、及び感光性樹脂組成物の製造方法
Document Type and Number:
Japanese Patent JP5878913
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which can be suitably used for formation of a solder resist layer and can suppress degradation of a cured film by light while using a resin prepared from an aromatic ring-containing epoxy resin as a matrix resin.SOLUTION: The photosensitive resin composition comprises at least one of the following components A1 and A2, and the following components B2, C and D. The components are: (A1) a photosensitive resin having at least two ethylenically unsaturated groups in one molecule, which is obtained from a hydrogenated epoxy resin that is obtained by hydrogenating an aromatic ring-containing epoxy resin; (A2) a photosensitive resin having at least two ethylenically unsaturated groups in one molecule, which is obtained from an epoxy resin having no aromatic ring; (B2) a hydrogenated epoxy resin epoxy compound having at least two epoxy groups in one molecule, which is obtained by hydrogenating an aromatic ring-containing epoxy resin; (C) a photopolymerization initiator; and (D) a diluent.
Inventors:
Wataru Hamada
Application Number:
JP2013260155A
Publication Date:
March 08, 2016
Filing Date:
December 17, 2013
Export Citation:
Assignee:
Mutual Chemical Industry Co., Ltd.
International Classes:
G03F7/027; C08F290/06; C08F290/12; C08G59/14; C08G59/20; G03F7/004; H05K3/28
Domestic Patent References:
JP2003043684A | ||||
JP2004151601A | ||||
JP2009194235A | ||||
JP2007322546A | ||||
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Foreign References:
WO2008050768A1 | ||||
WO2006109572A1 | ||||
WO2002077058A1 | ||||
WO2011030580A1 | ||||
WO2005100448A1 |
Attorney, Agent or Firm:
Keisei Nishikawa
Mizuhiji Katsuhisa
Yoshishige Takeo
Takeshi Sakaguchi
Hidetoshi Kitade
Nakaishi Haruki
Kyohei Tokioka
Yutaka Kimura
Mizuhiji Katsuhisa
Yoshishige Takeo
Takeshi Sakaguchi
Hidetoshi Kitade
Nakaishi Haruki
Kyohei Tokioka
Yutaka Kimura
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