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Patent Searching and Data


Title:
透明導電性フィルムの製造方法。
Document Type and Number:
Japanese Patent JP4656849
Kind Code:
B2
Abstract:

To provide a manufacturing method of a transparent conductive film which enables the fast and stable manufacture of the highly conductive film, and to provide a physical liquid developer used therefor.

The manufacturing method of the transparent conductive film comprises exposing a photosensitive material having a physical development nucleus layer and a silver halide emulsion layer on a transparent support body in this order, depositing metal silver imagewise on the physical development nucleus layer by the physical development, and then removing the layer provided on the physical development nucleus layer, wherein the physical development is performed using the physical liquid developer whose potassium ion concentration is 70 mol% or higher of the total alkali metal ions .

COPYRIGHT: (C)2005,JPO&NCIPI


Inventors:
Yoshio Shibata
Application Number:
JP2004064183A
Publication Date:
March 23, 2011
Filing Date:
March 08, 2004
Export Citation:
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Assignee:
Mitsubishi Paper Mills Co., Ltd.
International Classes:
G06F3/041; H01B13/00; G03C1/00; G03F7/07; H01B5/14
Domestic Patent References:
JP2003077350A
JP2003149769A
JP2000019740A
JP9281707A