Title:
陰イオン両親媒性ポリマーを含有する水性組成物の製作においてポリマー被膜を取り除く方法
Document Type and Number:
Japanese Patent JP2004527604
Kind Code:
A
Abstract:
This invention relates to a method to facilitate the removal of adherent polymeric films from a hard surface occasioned by the evaporation of solvent from compositions containing an anionic amphiphilic polymer, the method comprising incorporating a phosphate ester surfactant into the compositions, and washing the film from the surface to which it adheres.
More Like This:
WO/2009/058620 | NOZZLE ASSEMBLY FOR A WASHER |
WO/2008/143798 | AN APPARATUS, A SYSTEM AND A METHOD OF PREVENTING PREMATURE DRYING |
WO/2012/163154 | METHOD FOR CLEANING WAFER AFTER CHEMICAL-MECHANICAL PLANARIZATION |
Inventors:
Paul, Stanley
Application Number:
JP2002567997A
Publication Date:
September 09, 2004
Filing Date:
February 22, 2002
Export Citation:
Assignee:
P&G-Clairol, Inc.
International Classes:
B08B3/00; C03C23/00; C09D5/02; C09D9/04; C11D1/34; C11D1/78; C11D3/20; C11D3/37; C11D3/39; C11D11/00; C08K5/521; (IPC1-7): C11D1/34; B08B3/00; C11D3/20; C11D3/37; C11D3/39
Attorney, Agent or Firm:
Michiteru Soga
Michiharu Soga
Hidetoshi Furukawa
Suzuki Kenchi
Kajinami order
Michiharu Soga
Hidetoshi Furukawa
Suzuki Kenchi
Kajinami order