Title:
欠陥フォトマスクを修理するための方法およびシステム
Document Type and Number:
Japanese Patent JP4711251
Kind Code:
B2
Abstract:
A system and method for repairing a photomask (52) for use in a photolithography process is disclosed, the photomask (52), consisting of a substrate layer (38) and a chrome layer (36) over the substrate layer (38), having a defect (42) in the chrome layer (36), the method comprising: providing a pulsed laser source (1) for generating an ultra-short pulsed laser beam; providing optical elements for scanning, directing and focusing the pulsed laser beam at a desired target location; directing the pulsed laser beam through the substrate and focusing it on a target location located inside the substrate adjacent the defect (42) to write a diffractive optical element (34), thus changing the scattering properties of the substrate at the target location.
Inventors:
Zai, Eitan
Mitriev, Vladimir, Jay.
Ozmkov, Sergey, Vi.
Gretsky, Nikolai, N.
Ben-Zvi, Guy
Mitriev, Vladimir, Jay.
Ozmkov, Sergey, Vi.
Gretsky, Nikolai, N.
Ben-Zvi, Guy
Application Number:
JP2003570189A
Publication Date:
June 29, 2011
Filing Date:
December 12, 2002
Export Citation:
Assignee:
Carl Zeiss SMS Limited
International Classes:
A61N5/00; G03C5/00; G03F1/00; G03F9/00; G21G5/00; H01L21/027
Domestic Patent References:
| JP62066257A | ||||
| JP2001276985A | ||||
| JP2001324634A | ||||
| JP62237454A | ||||
| JP61044628A | ||||
| JP61228626A |
Attorney, Agent or Firm:
Kazunori Saito
Tetsuya Ito
Tetsuya Ito