Title:
合成ダイヤモンド材料を製造するためのマイクロ波プラズマ反応器
Document Type and Number:
Japanese Patent JP2014506292
Kind Code:
A
Abstract:
A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition includes a microwave generator configured to generate microwaves at a frequency f, a plasma chamber that defines a resonance cavity for supporting a microwave resonance mode, a microwave coupling configuration for feeding microwaves from the microwave generator into the plasma chamber, a gas flow system for feeding process gases into the plasma chamber and removing them therefrom, and a substrate holder disposed in the plasma chamber and having a supporting surface for supporting a substrate on which the synthetic diamond material is to be deposited in use. The resonance cavity is configured to have a height that supports a TM011 resonant mode at the frequency f and is further configured to have a diameter that satisfies the condition that a ratio of the resonance cavity height/the resonance cavity diameter is in the range 0.3 to 1.0.
Inventors:
Brandon John Robert
Karen Alexander Rum
Williams stephen david
Dodson Joseph Michael
Willman Jonathan James
Wort christopher john howard
Karen Alexander Rum
Williams stephen david
Dodson Joseph Michael
Willman Jonathan James
Wort christopher john howard
Application Number:
JP2013545202A
Publication Date:
March 13, 2014
Filing Date:
December 14, 2011
Export Citation:
Assignee:
Element Six Limited
International Classes:
C23C16/511; C23C16/27; H05H1/46
Domestic Patent References:
| JPH09111461A | 1997-04-28 | |||
| JPH07142195A | 1995-06-02 | |||
| JPH09111461A | 1997-04-28 | |||
| JPH07142195A | 1995-06-02 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Disciple Maru Ken
Ino Sato
Mitsuru Matsushita
Ichiro Kurasawa
Makoto Watanabe
Sadao Kumakura
Disciple Maru Ken
Ino Sato
Mitsuru Matsushita
Ichiro Kurasawa
Makoto Watanabe