Title:
マイクロリソグラフィ投影露光装置のミラー
Document Type and Number:
Japanese Patent JP6590829
Kind Code:
B2
Abstract:
A mirror, in particular for a microlithographic projection exposure apparatus has an optically effective surface, wherein the mirror has a reflectivity of at least 0.5 for electromagnetic radiation which has a prescribed working wavelength and impinges on the optically effective surface at an angle of incidence based on the respective surface normal of at least 65°, wherein the mirror has at least one layer (160, 170, 320) which comprises a compound of an element of the second period and an element of the 4d transition group, wherein the mirror has a protective layer (430, 530, 630, 730) arranged on top in the direction of the optically effective surface, wherein the material of the layer (420, 510, 620, 705) arranged in each case underneath the protective layer in the direction of the optically effective surface has a lower absorption than the material of the protective layer (430, 530, 630, 730).
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Inventors:
Hartmut Enquiche
Application Number:
JP2016556940A
Publication Date:
October 16, 2019
Filing Date:
February 19, 2015
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B5/08; G02B19/00
Domestic Patent References:
| JP2005268359A | ||||
| JP2006317913A | ||||
| JP2003303756A |
Foreign References:
| WO2012126867A1 |
Attorney, Agent or Firm:
Kenji Sugimura
Groundwork Kenichi
Tsubouchi Shin
Groundwork Kenichi
Tsubouchi Shin