Title:
A moisture solution reaction apparatus using a stabilization method and the method of a semiconductor photoelectrical pole of a visible light response
Document Type and Number:
Japanese Patent JP5988090
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a stabilization method for a photoelectrode capable of improving the stability in photoreaction of its semiconductor material without using a sacrifice reductant agent, and preventing reduction in efficiency, in photo-electrochemical reaction using a visible light responsive n-type semiconductor containing a metal element and oxygen as the photoelectrode.SOLUTION: The same metal element ions as a configuration element of a semiconductor is dissolved in reaction solution. A valence of the metal element ions in the reaction solution is set to be a high oxidation number that is stable in a steady state of the reaction, and thereby, the stability of a visible light responsive semiconductor photoelectrode can be improved.
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Inventors:
Kazuhiro Sayama
Saito Rie
One Nini
Yugo Mitsuishi
Saito Rie
One Nini
Yugo Mitsuishi
Application Number:
JP2012152505A
Publication Date:
September 07, 2016
Filing Date:
July 06, 2012
Export Citation:
Assignee:
National Institute of Advanced Industrial Science and Technology
International Classes:
C25B15/00; B01J35/02; C25B9/00; C25B11/06; H01M14/00
Domestic Patent References:
| JP2007070675A |
Foreign References:
| CA408311A1 | ||||
| US4474656 |
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