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Patent Searching and Data


Title:
WASHER FOR CLEAN ROOM
Document Type and Number:
Japanese Patent JPH0661207
Kind Code:
A
Abstract:

PURPOSE: To provide a washer for a clean room capable of carrying out semiconductor wafers, etc., to a next step without exposing the semiconductor wafers etc. after washed to a clean room atmosphere and also keeping them for many hours.

CONSTITUTION: In a washer for a clean room in which a substrate W for an electric apparatus, received in a cassette 40, is carried in from a cassette carry-in inlet 12 of a casing 11 and washed in a specific washing step, the casing 11 is integral with means for receiving the cassette 40 passed through the last step of a washing step into a mobile airtight container 60, and purging means for gas-purging the mobile airtight container with inactive gas for a substrate, and the casing 11 has a carry-in inlet 13 and a carry-out outlet 13 for the mobile airtight container.


Inventors:
YAMASHITA TEPPEI
MURATA MASANAO
TANAKA MIKI
MORITA AKIYA
KONO HITOSHI
HAYASHI MICHIHIRO
OKUNO ATSUSHI
NAKAMURA AKIO
Application Number:
JP21154692A
Publication Date:
March 04, 1994
Filing Date:
August 07, 1992
Export Citation:
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Assignee:
SHINKO ELECTRIC CO LTD
International Classes:
H01L21/304; H01L21/677; H01L21/68; (IPC1-7): H01L21/304; H01L21/68
Attorney, Agent or Firm:
Kobayashi