Title:
多反応性線形シロキサン化合物、当該化合物から製造されるシロキサン系重合体及び当該重合体を用いた絶縁膜の製造方法
Document Type and Number:
Japanese Patent JP4549832
Kind Code:
B2
Abstract:
A novel multi-functional linear siloxane compound, a siloxane polymer prepared from the siloxane compound, and a process for forming a dielectric film by using the siloxane polymer. The linear siloxane polymer has enhanced mechanical properties (e.g., modulus), superior thermal stability, a low carbon content and a low hygroscopicity and is prepared by the homopolymerization of the linear siloxane compound or the copolymerization of the linear siloxane compound with another monomer. A dielectric film can be produced by heat-curing a coating solution containing the siloxane polymer which is highly reactive. The siloxane polymer prepared from the siloxane compound not only has satisfactory mechanical properties, thermal stability and crack resistance, but also exhibits a low hygroscopicity and excellent compatibility with pore-forming materials, which leads to a low dielectric constant. Furthermore, the siloxane polymer retains a relatively low carbon content but a high SiO2 content, resulting in its improved applicability to semiconductor devices. Therefore, the siloxane polymer is advantageously used as a material for dielectric films of semiconductor devices.
Inventors:
Lee Shun
Proclaimed white
Chung Hyuntan
Hayashi Chin Toru
Application
Proclaimed white
Chung Hyuntan
Hayashi Chin Toru
Application
Application Number:
JP2004358183A
Publication Date:
September 22, 2010
Filing Date:
December 10, 2004
Export Citation:
Assignee:
SAMSUNG ELECTRONICS CO.,LTD.
International Classes:
C07B61/00; C07F7/18; C07F7/08; C07F7/21; C08G77/04; C08G77/50; C08G77/60; G03F7/075; H01L21/312
Domestic Patent References:
| JP11181287A | ||||
| JP10330622A | ||||
| JP2001348430A | ||||
| JP2000212190A | ||||
| JP2000351786A | ||||
| JP9012709A |
Foreign References:
| US5986124 | ||||
| WO1996000758A1 |
Attorney, Agent or Firm:
Mikio Hatta
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Toshifumi Fujii
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Toshifumi Fujii