Title:
The nano structure thin film catalyst by which annealing was carried out
Document Type and Number:
Japanese Patent JP5973423
Kind Code:
B2
Abstract:
This disclosure provides methods of making an enhanced activity nanostructured thin film catalyst by radiation annealing, typically laser annealing, typically under inert atmosphere. Typically the inert gas has a residual oxygen level of 100 ppm. Typically the irradiation has an incident energy fluence of at least 30 mJ/mm2. In some embodiments, the radiation annealing is accomplished by laser annealing. In some embodiments, the nanostructured thin film catalyst is provided on a continuous web.
Inventors:
Mark K. Dive
Robert El W Smithson
Charles J. Studiner, The Force
Susan M. Hendricks
Michael Jay Krukowski
Andrew Jay El Steinbach
Robert El W Smithson
Charles J. Studiner, The Force
Susan M. Hendricks
Michael Jay Krukowski
Andrew Jay El Steinbach
Application Number:
JP2013508165A
Publication Date:
August 23, 2016
Filing Date:
April 26, 2011
Export Citation:
Assignee:
3M INNOVATIVE PROPERTIES COMPANY
International Classes:
B01J23/89; B01J37/08; B01J37/34; B82Y30/00; B82Y40/00
Domestic Patent References:
| JP59108272A | ||||
| JP2003024798A | ||||
| JP2009512163A |
Foreign References:
| WO2006088194A1 | ||||
| US20050101481 |
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Masatoshi Takahashi
Satoshi Deno
Naori Kota
Naohisa Akashi
Takashi Ishida
Tetsuji Koga
Masatoshi Takahashi
Satoshi Deno
Naori Kota
Naohisa Akashi
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