Title:
固体イオン導電体を用いた負イオンビーム生成装置、固体イオン導電体を用いた負イオンビーム打込み装置及び固体イオン導電体を用いた宇宙空間移動用推進装置
Document Type and Number:
Japanese Patent JP4253813
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a negative ion beam forming method efficiently forming negative ion beams at a low cost, a negative ion beam forming device utilizing the method, a negative ion beam implanting device, and a propulsion unit for space movement. SOLUTION: The negative ion beam implanting device using a solid ion conductor is composed of an ionization electrode 12; the solid ion conductor 11 coming in contact with the ionization electrode 12, extraction electrodes 13 facing the surface 11b of the solid ion conductor on the opposite side to a surface 11a on which the ionization electrode 12 is arranged, a target 19 arranged in the rear of the extraction electrodes 13, a vacuum vessel 15 housing the solid ion conductor 11, the extraction electrodes 13, and the target 19 and being kept in a vacuum, and a DC power source 16 applying voltage to the ionization electrode 12, the extraction electrode 13, and the target 19 so as to have higher potential in this order starting with the ionization electrode side.
Inventors:
Tatsuya Kawada
Junichiro Mizusaki
Yutaka
Yukio Fujiwara
Junichiro Mizusaki
Yutaka
Yukio Fujiwara
Application Number:
JP2002239706A
Publication Date:
April 15, 2009
Filing Date:
August 20, 2002
Export Citation:
Assignee:
Japan Science and Technology Agency
International Classes:
F03H1/00; H01J27/26; H01J37/08; H01J37/317
Domestic Patent References:
| JP63264849A | ||||
| JP6258278A | ||||
| JP11230024A |
Foreign References:
| WO1996017803A1 |
Attorney, Agent or Firm:
Kazuyuki Hirayama