Title:
Negative photosensitive resin composition, resin cured film, partition wall and optical element
Document Type and Number:
Japanese Patent JP6341093
Kind Code:
B2
Abstract:
To provide a negative photosensitive resin composition which is capable of imparting good ink repellency to a cured film, particularly to the upper surface of partition walls, and which has characteristics such that an ink repellent agent is less likely to remain in opening sections defined by the partition walls even without UV/O3 irradiation treatment, and the ink is permitted to uniformly wet-spread without unevenness. A negative photosensitive resin composition characterized by comprising (A) an alkali-soluble resin or alkali-soluble monomer, which has a photo-curability, (B) a photopolymerization initiator, (C) an ink repellent agent having fluorine atoms, and (D) a compound which is a partially hydrolyzed condensate of a hydrolysable silane compound mixture containing a hydrolysable silane compound having a mercapto group and a hydrolysable group and/or a hydrolysable silane compound having a group with an ethylenic double bond and a hydrolysable group, and which has no fluorine atom.
Inventors:
Keigo Matsuura
Hideyuki Takahashi
Masayuki Kawashima
Daisuke Kobayashi
Hideyuki Takahashi
Masayuki Kawashima
Daisuke Kobayashi
Application Number:
JP2014544530A
Publication Date:
June 13, 2018
Filing Date:
October 29, 2013
Export Citation:
Assignee:
Asahi Glass Co., Ltd.
International Classes:
G03F7/004; B32B27/18; C08F290/00; G03F7/027; G03F7/075
Domestic Patent References:
| JP2011039404A | ||||
| JP2005153390A | ||||
| JP2011237691A | ||||
| JP2009204805A | ||||
| JP2011048195A | ||||
| JP2010217910A |
Foreign References:
| WO2012132755A1 |
Attorney, Agent or Firm:
Patent Business Corporation Sakura International Patent Office