Title:
新規な感光性樹脂組成物
Document Type and Number:
Japanese Patent JP2007509371
Kind Code:
A
Abstract:
A positive-working photosensitive composition containing one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate.
Inventors:
Ahmad A. Niini
Richard Houpla
David Be Powell
John Mettivia
Ilya Raskin
Richard Houpla
David Be Powell
John Mettivia
Ilya Raskin
Application Number:
JP2006535640A
Publication Date:
April 12, 2007
Filing Date:
October 15, 2004
Export Citation:
Assignee:
FujiFilm Electronic Materials USA, Inc.
International Classes:
G03F7/023; G03C5/18; G03F7/022; G03F7/075; G03F7/38; G03F7/40; H01L21/027; G03F
Domestic Patent References:
JPH11143070A | 1999-05-28 | |||
JP2000214582A | 2000-08-04 | |||
JPH10513576A | 1998-12-22 | |||
JP2002526794A | 2002-08-20 | |||
JP2002526795A | 2002-08-20 |
Attorney, Agent or Firm:
Chika Takagi
Junji Yuda
Shoji Miwa
Junji Yuda
Shoji Miwa