新規含硫黄エチレン性不飽和基含有化合物、及びその重合体

Title:

新規含硫黄エチレン性不飽和基含有化合物、及びその重合体

Document Type and Number:

Japanese Patent JP5213100

Kind Code:

B2

Abstract:

To provide a new sulfur-containing compound, and a radiation-curable composition obtained by using the same yielding a cured material having a high reflective index and a high Abbe number.

Disclosed are a sulfur-containing compound comprising an ethylenically unsaturated group obtained by causing a new sulfur-containing compound represented by formula (1) to react with a compound comprising an ethylenically unsaturated group, and its polymer.

More Like This:

JP2001031598	PRODUCTION OF FLUORINE-CONTAINING AROMATIC COMPOUND AND INTERMEDIATE THEREFOR
JP4968830	Radical polymerizable compound with cyclic dithiocarbonate group
JPH0761965	INDUSTRIAL APPLICABILITY [title of invention] Alkene, alkyne and cycloalkyne derivatives and their production methods.

Inventors:

Okue Rie
Shinji Ando
Mitsuru Ueda
Shuichi Sugawara

Application Number:

JP2007314695A

Publication Date:

June 19, 2013

Filing Date:

December 05, 2007

Export Citation:

Click for automatic bibliography generation Help

Assignee:

JSR CORPORATION
National University Corporation Tokyo Institute of Technology

International Classes:

C07D339/06; C08F20/38

Domestic Patent References:

JP2007224294A
JP3223309A
JP5872901A

Other References:

Tetrahedron Letters,1997年,Vol.38, No.45,pp.7927-7930

Attorney, Agent or Firm:

Kihei Watanabe

Previous Patent: JPS5213099

Next Patent: SWITCHING OPERATION SYSTEM FOR MANUAL AND AUTOMATIC OPERATION CIRCUIT BY MEANS OF PUMP NOTOR AND HYD...