Title:
METHOD FOR OXYNITRIDING QUARTZ GLASS AND SURFACE TREATMENT
Document Type and Number:
Japanese Patent JPH0753242
Kind Code:
A
Abstract:
PURPOSE: To provide a method for oxynitriding quartz. glass and a method for treating its surface by which the oxynitriding treatment of the surface can be easily and rapidly carried out at a relatively low temp. and the peeling of a formed surface layer due to repeated heat cycles is not caused.
CONSTITUTION: Quartz glass to be treated is heated at 700-1,200°C in an atmosphere of a gaseous ammonia-hydrocarbon mixture or in an atmosphere of gaseous ammonia in which solid carbon exists to form a silicon oxynitride film on the surface of the quartz glass. The oxynitrided surface of the quartz glass is coated with a silicon nitride film, e.g. by CVD.
Inventors:
YAMAOKA SHUSUKE
KURONO NOBUHISA
KOTAKA HIROAKI
MATSUO HIDEYASU
AIBA YOSHIRO
KURONO NOBUHISA
KOTAKA HIROAKI
MATSUO HIDEYASU
AIBA YOSHIRO
Application Number:
JP21708693A
Publication Date:
February 28, 1995
Filing Date:
August 09, 1993
Export Citation:
Assignee:
TOSHIBA CERAMICS CO
International Classes:
C03C17/22; C03C17/34; C03C17/23; C04B41/87; (IPC1-7): C03C17/23; C04B41/87
Attorney, Agent or Firm:
Makiko Akano (1 outside)