Title:
An operating method of a plasma treatment apparatus and a plasma treatment apparatus
Document Type and Number:
Japanese Patent JP6144917
Kind Code:
B2
Abstract:
The purpose of the present invention is to reliably detect variation of a reflected wave and prevent abnormal discharge in advance in a plasma processing apparatus supplying high frequency power associated with plasma from at least two high frequency power sources to an upper electrode and/or a lower electrode, respectively. A threshold setting unit (123) switches blocking threshold levels for a first high frequency power supply unit (65) and a second high frequency power supply unit (75) at time T3 to relatively lower levels after the high frequency supply from a second high frequency power supply unit (75) is stabilized. The relatively lower levels for the first high frequency power supply unit (65) and the second high frequency power supply unit (75) are concurrently maintained for thesame time (from time T3 until T4). If a first power supply increase is started by the first high frequency power supply unit (65) at time T4, the threshold setting unit (123) resets the blocking threshold levels to be increased to relatively higher levels. The relatively higher levels for the high frequency power supply unit (65) and the second high frequency power supply unit (75) are concurrently maintained for the same time (from time T4 unitl T6).
Inventors:
Furuya Atshiro
Toyo Toyo
Toyo Toyo
Application Number:
JP2013006074A
Publication Date:
June 07, 2017
Filing Date:
January 17, 2013
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H05H1/00; H01L21/3065; H05H1/46
Domestic Patent References:
| JP2007115860A | ||||
| JP2010135422A | ||||
| JP2005236138A | ||||
| JP2009070844A |
Foreign References:
| WO2011125733A1 | ||||
| WO1999011103A1 | ||||
| US6365060 | ||||
| US20050205208 |
Attorney, Agent or Firm:
Kazuhiro Watanabe
Katsumi Hoshimiya
Tatsuya Josawa
Katsumi Hoshimiya
Tatsuya Josawa