Title:
An operation method of a lithography device and a device
Document Type and Number:
Japanese Patent JP6017618
Kind Code:
B2
Abstract:
A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
Inventors:
Croyne, Christian, Geralds, Norbertas, Hendricus, Marie
Tencate, Nikolaas
Kemper, Nikolaas, Rudolph
Stavenga, Marco, Coult
Eumelen, eric, henricus, egidius, catherine
Leepen, Michael
Elyseva, Olga, Vladimirovna
Gunter, Taymen, Wilfred, Matisse
Van der wenken, michael, christian
Tencate, Nikolaas
Kemper, Nikolaas, Rudolph
Stavenga, Marco, Coult
Eumelen, eric, henricus, egidius, catherine
Leepen, Michael
Elyseva, Olga, Vladimirovna
Gunter, Taymen, Wilfred, Matisse
Van der wenken, michael, christian
Application Number:
JP2015087473A
Publication Date:
November 02, 2016
Filing Date:
April 22, 2015
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G03F7/20
Domestic Patent References:
| JP2007251165A | ||||
| JP2007266603A | ||||
| JP2007504662A | ||||
| JP2007201452A | ||||
| JP2004289127A | ||||
| JP2006303505A | ||||
| JP2006060223A | ||||
| JP2005101488A |
Foreign References:
| WO2005074014A1 | ||||
| WO2005057636A1 | ||||
| WO2006049134A1 | ||||
| WO2006064851A1 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki
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